A fast, safe and simple dissolution method
Claisse introduces a new sample processing method that uses a catalyst to dissolve high-silicon samples for ICP-OES analysis
Using ICP-OES to analyze metal elements in high-silicon samples is a very difficult task, mainly due to the need to completely dissolve SiO2 in the samples. Due to the mixing of hydrofluoric acid, it is necessary to dissolve SiO2 in the solution regardless of whether microwave-free digestion is used.
Claisse launched a solution using lithium metaborate to dissolve. Under the action of common catalysts, with the help of zeolite and refractory materials, the sample can be fully dissolved, and then tested by ICP_OES. There is no need to use strong acids and a large number of sample dissolution methods.
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